Oxygen in Silicon
R. K. Willardson · Eicke R. Weber · Albert C. Beer · Fumio Shimura
ສ.ຫ. 1994 · Semiconductors and Semimetals ຫົວທີ 42 · Academic Press
ປຶ້ມອີບຸກ
679
ໜ້າ
family_home
ມີສິດ
info
reportບໍ່ໄດ້ຢັ້ງຢືນການຈັດອັນດັບ ແລະ ຄຳຕິຊົມ ສຶກສາເພີ່ມເຕີມ
ກ່ຽວກັບປຶ້ມ e-book ນີ້
This volume reviews the latest understanding of the behavior and roles of oxygen in silicon, which will carry the field into the ULSI era from the experimental and theoretical points of view. The fourteen chapters, written by recognized authorities representing industrial and academic institutions, cover thoroughly the oxygen related phenomena from the crystal growth to device fabrication processes, as well as indispensable diagnostic techniques for oxygen. - Comprehensive study of the behavior of oxygen in silicon - Discusses silicon crystals for VLSI and ULSI applications - Thorough coverage from crystal growth to device fabrication - Edited by technical experts in the field - Written by recognized authorities from industrial and academic institutions - Useful to graduate students, scientists in other disciplines, and active participants in the arena of silicon-based microelectronics research - 297 original line drawings
ໃຫ້ຄະແນນ e-book ນີ້
ບອກພວກເຮົາວ່າທ່ານຄິດແນວໃດ.
ອ່ານຂໍ້ມູນຂ່າວສານ
ສະມາດໂຟນ ແລະ ແທັບເລັດ
ຕິດຕັ້ງ ແອັບ Google Play Books ສຳລັບ Android ແລະ iPad/iPhone. ມັນຊິ້ງຂໍ້ມູນໂດຍອັດຕະໂນມັດກັບບັນຊີຂອງທ່ານ ແລະ ອະນຸຍາດໃຫ້ທ່ານອ່ານທາງອອນລາຍ ຫຼື ແບບອອບລາຍໄດ້ ບໍ່ວ່າທ່ານຈະຢູ່ໃສ.
ແລັບທັອບ ແລະ ຄອມພິວເຕີ
ທ່ານສາມາດຟັງປຶ້ມສຽງທີ່ຊື້ໃນ Google Play ໂດຍໃຊ້ໂປຣແກຣມທ່ອງເວັບຂອງຄອມພິວເຕີຂອງທ່ານໄດ້.
eReaders ແລະອຸປະກອນອື່ນໆ
ເພື່ອອ່ານໃນອຸປະກອນ e-ink ເຊັ່ນ: Kobo eReader, ທ່ານຈຳເປັນຕ້ອງດາວໂຫຼດໄຟລ໌ ແລະ ໂອນຍ້າຍມັນໄປໃສ່ອຸປະກອນຂອງທ່ານກ່ອນ. ປະຕິບັດຕາມຄຳແນະນຳລະອຽດຂອງ ສູນຊ່ວຍເຫຼືອ ເພື່ອໂອນຍ້າຍໄຟລ໌ໄໃສ່ eReader ທີ່ຮອງຮັບ.
